According to the different shapes, aluminum sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) aluminum targets. 5N aluminum sputtering target refers to the high purity aluminum sputtering target which purity is 99.999%.
Aluminum Al Target Purity 99.9-99.99% L4000mm Thick 6-15mm Straight Dogbone Customized Vacuum Spraying Target (96%) 2.6g/cm3 Min. Order: 1 Piece Type: Metal Target
Product nameigh purity chromium sputtering target. Place of Originaoji,China (Mainland) Shapequareound, according to your request. Materialermanium. Purity:99.999%. Application used to different products: germanium massager, germanium bracelet, germanium watch, germanium glasses, germanium clothes...
Al50Cr50 Alloy Target Introduction Aluminum chromium alloy target is a kind of high-purity aluminum chromium alloy material made of metal aluminum and metal chromium. It can be used for sputtering deposition. According to the different shapes, aluminum chromium alloy targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) aluminum ...
Purity: 99.9 - 99.999% Target Shape: plate, wafer, rectangular, square, circle, tube, step wafer, step rectangle, and customer tailored. ... Ti Titanium rotary tube target titanium sputtering target. ... High purity AZO sputtering target 99.99% AZO target. Pure
High purity metal targets Location:HOME > Products > High purity metal targets High purity chromium target 99.5%~99.95% 3N 4N 5N High Purity Aluminum Target, Aluminum Tube Target,
Previously, the titanium target with a purity reached 99.995 %, was able to meet the process requirements of the electronics industry. However, the current industry requires material purity of 99.999% and even 99.9999%. Not all sputtering target manufacturers can
Matsurf Technologies Inc is specialized at manufacturing high purity metal, oxide, nitride, fluoride, silicide, boride, sulfide, selenide, telluride, and carbide powders, pellets, shots, and chunks for evaporation. High purity Barium metal: Barium piece/pellet (2-5mm, purity 99.9%) High purity Barium (Ba) pellet sealed in argon filled metal can: purity: 99.9%, Dimension: 2-5mm
American Elements specializes in manufacturing high purity and ultra high purity materials ranging from 99.999% (5N), 99.9999% (6N), 99.99995% (6N5), and in some cases up to 99.99999% (7N) and 99.999999% (8N), such as 8N gallium ingots and 8N mercury metal. We can produce materials to specific grades including UP/UHP, semiconductor, electronic, deposition, fiber optic, and MBE grades.
5 NEW AMAT 3070-00014 Vacuum bellows Flex NW50 1.75ID 5.20L 321SST. 46. Applied Materials AMAT. 3070-00078. NEW AMAT 3070-00078, HPS Division KF50 Vacuum Bellows NW-50, 7 inch, REV A. 47. Applied Materials AMAT. 3070-01004. AMAT 3070-01004 FTG
The target with the purity up to 99.999% can be used for the filler of the semiconductor chip layer and the tungsten plug. Please refer to the tungsten sheet or the tungsten
High purity metal targets Location:HOME > Products > High purity metal targets High purity chromium target 99.5%~99.95% 3N 4N 5N High Purity Aluminum Target, Aluminum Tube Target,
ACETRON 4N 99.99% High Purity Silicon+Aluminum Metal Alloy Rotary Target/Sputtering Target for Vacuum/PVD Coating US $99-99,999 / Piece Find Similar Products By Category
Cd Target, Purity: 99.999% 2dia. x1/8 with Copper backing plate High purity Stainless Steel target, 2 dia.x 0.3mm Cu(9)In(11) target, Purity: 99.99%, 4 dia.x 0.125
Aluminum Cylinder / Granular Sputtering Targets With 99.999% Super High Purity Ag Silver Granular 99.99% Sputtering Targets 3x3mm / 6x6mm / 3x6mm 99.5% 99.9% 99.95% Chrome Sputtering
ACETRON 4N5 99. 995% High Purity SiO2 Sputtering Target for Vacuum/PVD Coating. US $ 99-99,999 / Piece FOB. MOQ: 1 Piece. Since 2021. Main Products. Planar Target, Rotatory Target,
ACETRON 5N 99.999% High Purity Ag/Silver Rotary Sputtering Target for PVD Coating Video ACETRON 4N5 99. 995% High Purity Ag Alloy Sputtering Target for Vacuum/PVD Coating
Jan 22, 2021 Sputtering target material for semiconductor has a high requirement for the purity of the target material, which is generally more than 4N or 5N, so the target material for semiconductor
Jan 22, 2021 AEM offers Titanium alloy targets such as Tungsten titanium (W/Ti 90/10 wt%) sputtering target, an essential material for the semiconductor and solar industry. The W/Ti sputtering target
US10670384B2 US16/075,037 US201716075037A US10670384B2 US 10670384 B2 US10670384 B2 US 10670384B2 US 201716075037 A US201716075037 A US 201716075037A US 10670384 B2
American Elements specializes in manufacturing high purity and ultra high purity materials ranging from 99.999% (5N), 99.9999% (6N), 99.99995% (6N5), and in some cases up to 99.99999% (7N) and
China Al Target Thin Film Materials Aluminium Sputtering Target with High Purity 99.99% 99.999% 99.9999%, Find details about China Aluminum Tube, Aluminum Target from Al Target Thin Film
The sputtering targets purity can be 99% to 99.999%, different from metals. The shape can be round, rectangle, cathode and rotary tube, and also produced per the drawing supplied by customer. Here
Under the numerical control process and high purity, metal sputtering targets must be as smooth as possible. We offer metal targets in various purity levels to suit customers specific requirements, with
High purity aluminum (Al) target, 2 dia.x 0.125, 99.99% -EQ-TGT-AL-2 Sale Price: Email for Pricing High purity aluminum (Al) target, 4 dia.x 0.25 4N - TGTAl101D635TUS
Matsurf Technologies Inc is specialized at manufacturing high purity metal, oxide, nitride, fluoride, silicide, boride, sulfide, selenide, telluride, and carbide powders, pellets, shots, and chunks for
Cd Target, Purity: 99.999% 2dia. x1/8 with Copper backing plate High purity Stainless Steel target, 2 dia.x 0.3mm Cu(9)In(11) target, Purity: 99.99%, 4 dia.x 0.125
Purity: 99.95%, 99.999%, 99.9999% Shape: Discs, Rectangle, Tube, Custom-Made Application: contacts, hard adherent films, Ultrapure tungsten( 5N or 6 N), due to their high resistance, high
AEM Deposition: Nickel sputtering target supplier and manufacturer in China! Supply Ni sputtering target for the world. Including planar nickel target and rotary nickel target. Purity: 99.9-99.999%. Nickel
SAM offers selenide-ceramic sputtering target with 99.9%, 99.95%, 99.99%, 99.995%, 99.999% purity in various shapes sizes for thin-film coating. Telluride Ceramic SAM can customize telluride ceramic
Titanium Aluminum Sputtering Target. Shape: Round target / plate target / tube target Titanium Content: 99.8 (%) Impurity Content: 0.02> Density: 4.51 or 4.50 Application: Semiconductor
Mitsui Aluminum Co., High Purity (4N up) Aluminum Material supply agreement Item : Billet, Slave, Plate Tube (Sputtering Target) UNILAM Co., UV Lamp overseas marketing, sales Agent agreement
Ota nyt Titanium Rotary Sputtering Target. Material: High purity (99.5%, 99.99%, 99.995%), Grade 1, Grade 2, TiAl6V4 Shape: Tube ( Rotary target, OD: 20mm~160mm ...
Matsurf Technologies Inc is a Minnesota based materials company.We are a manufacturer and distributor of high quality reliable customized planner and rotation targets for physical vapor
Oct 20, 2021 Zhongzheng Metallurgy Technology(Shenzhen) Co. Ltd. (referred to as the ZY) a target R D, production, sales in one of the high-tech enterprises, polymerization domestic advanced
The highest purity of Nickel sputtering target is 99.999%, it is normally used in the semiconductor and microelectronics industries, Nickel sputtering target is the key material for semiconductor back
High purity aluminum plate, plane target. Purity 99.99% 99.999% Grain size <15 mu m. Fast delivery. High purity aluminum tube, rotating aluminum target. Purity 4N or 5N Stand
The sputtering targets purity can be 99% to 99.999%, different from metals. The shape can be round, rectangle, cathode and rotary tube, and also produced per the drawing supplied by customer. Here
99.999% (5N) Nickel Sputtering Target Tube. Outside Diameter: 3.5. Inside Diameter: 3.0. Length: 10.25. This Nickel tube is actually a sputtering target. We started with a 5N Nickel ingot and
Ota nyt Titanium Rotary Sputtering Target. Material: High purity (99.5%, 99.99%, 99.995%), Grade 1, Grade 2, TiAl6V4 Shape: Tube ( Rotary target, OD: 20mm~160mm ...
Cd Target, Purity: 99.999% 2dia. x1/8 with Copper backing plate High purity Stainless Steel target, 2 dia.x 0.3mm Cu(9)In(11) target, Purity: 99.99%, 4 dia.x 0.125
Kreipkits dabar Titanium Rotary Sputtering Target. Material: High purity (99.5%, 99.99%, 99.995%), Grade 1, Grade 2, TiAl6V4 Shape: Tube ( Rotary target, OD: 20mm ...
The highest purity of Nickel sputtering target is 99.999%, it is normally used in the semiconductor and microelectronics industries, Nickel sputtering target is the key material for semiconductor back
Model NO.: 17062304 Purity: 99.999% Shape: Round Alloy: Non-alloy Color: Silvery Usage: Thin Film Coating
Mar 27, 2012 99.999% Copper Foil 99.999% Dysprosium Foil 99.999% Gold Foil Rods and Plates. American Elements casts any of the rare earth metals and most other advanced material into rod, bar
Mitsui Aluminum Co., High Purity (4N up) Aluminum Material supply agreement Item : Billet, Slave, Plate Tube (Sputtering Target) UNILAM Co., UV Lamp overseas marketing, sales Agent agreement
It is a soft, malleable and ductile metal with very high thermal and electrical conductivity. A freshly exposed surface of pure copper has a reddish-orange color. The features of the 99.999% copper
Cd Target, Purity: 99.999% 2dia. x1/8 with Copper backing plate. High purity Stainless Steel target, 2 dia.x 0.3mm. Cu (9)In (11) target, Purity: 99.99%, 4 dia.x 0.125. Lab Precision Temperature
High Purity Magnetron Sputtering Aluminum Titanium Alloy Target AlTi. Related tags : TiAl alloy target, ... High Purity Tungsten Target, 99.99% Min Tungsten Sputtering Target. US$ 100 ~ 200 / Kilogram;
99.5%-99.95% High Purity Chromium Sputtering Target Cr Target Products attributes of Cr sputtering target Packaging of Tin Powder: Vacuum sealed package inside, then wrapped with bubble and